Olympus Split Field Microscope

The Olympus Split Field Microscope delivers simultaneous dual-field observation for rapid comparative analysis in research and industrial inspection. Built on infinity-corrected UIS2 optics, this system supports seven distinct observation methods—brightfield, darkfield, phase contrast, Nomarski DIC, polarized light, fluorescence, and mixed illumination—enabling flexible sample characterization across materials science, semiconductors, and life sciences.

– Technical Specifications

Optical System
• Infinity-corrected UIS2 optics with wavefront aberration control
• Field of view up to FN 26.5 with select configurations
• Plan, Plan Apochromat, and UPLXAPO objective series available
• UIS2 objectives offer high numerical aperture, extended working distances, and chromatic aberration correction
• IR objectives for semiconductor inspection
• Hard-coated wide-field eyepieces (e.g., 10x/22) with diopter adjustment and high transmission

Illumination & Focusing
• White LED illumination (reflected and transmitted) with consistent color temperature and energy efficiency
• LED output comparable to or exceeding 100 W halogen lamp performance
• Coaxial coarse and fine focus adjustment; 25 mm focus travel
• Coarse adjustment: 100 µm per revolution, minimum division 1 µm
• Upper stop and torque adjustment on coarse mechanism

Specimen Stage
• Mechanical XY stage with 76 mm × 52 mm dimensions
• Stage movement: 76 mm (X-direction) × 50 mm (Y-direction)
• Coaxial mechanical drive with left-hand operation and torque control
• Graduated scales for precise positioning
• Abrasion-resistant ceramic coating

Split-Field Capability
Simultaneous comparison of two distinct fields of view or sample areas accelerates analytical workflow in quality assurance and research.

– Key Features

• Seven observation methods in single configuration
• Parfocal, interchangeable objective turret
• Long working distance objectives reduce sample handling constraints
• Flat-field Plan optics for transmission accuracy

– Typical Applications

• Materials metallography and failure analysis
• Semiconductor wafer and component inspection
• Biological tissue and cellular examination
• Quality control in manufacturing

– Compatibility & Integration

The UIS2 optical standard enables integration with auxiliary condensers, specialized objective series, and modular illumination systems tailored to reflected or transmitted light workflows.